Department of Metallurgical Engineering, Tokyo Institute of Technology^* Dept. of Metallurgy and Ceramics Science, TokyoTech, Japan^**
○Takashi Harumoto^* Yasuaki Hodumi^** Yoshio Nakamura^**

Structure analysis of a Co(Pt)/AlN multilayer film has been performed by X-ray reflectometry and diffraction. A layer structure is fabricated at room temperature on fused silica glass. Each layer consists of polycrystalline AlN with thickness of 10nm and Co-Pt fcc solid solution (hereafter denoted by Co(Pt)) with thickness of 2 nm, and the layers are stacked 5 times and then capped by AlN with 10 nm thickness. The specimen was annealed at 400°C.
Preliminary diffraction study has shown that the film shows strong preferred orientation of (001) for AlN and (111) for fcc Co(Pt). Figure 1 shows the X-ray diffraction profiles of low angle (2theta=0 to 11°) region and medium angle (2theta=34 to 46°) region. At the medium angle region, strong peak located at the left is the 002 reflection of AlN and broad and wavy peak is the 111 reflection of Co(Pt), which indicates the formation of superlattice even after heat treatment. At the low angle region, we can recognize total reflection and diffraction peaks indexed by 1 to up 18th. From diffraction data, we can successfully analyze the multilayer; period of superlattice is 15.0 nm, thickness of Co(Pt) layer is 2.7 nm, average refractivity of the S.L. is 1 - 1.6*10-5, roughness of is 2.0 nm.