-Presentations-

　　　　　　　　　　　　　　　　　　　　　
12月13日（Tue.） 10:00-17:30
　Time 　 Title
 　Speaker
09:30 Start accepting  
10:00-10:10 Opening message Sunao Ishihara (The U. of Tokyo)
Keynote・Invited　　10:10-12:00　　　 chairperson: Sunao Ishihara (The U. of Tokyo)
10:10-10:50 -Keynote-
”Neuromorphic Device for Cognitive Computing in the Big Data era”　
Shintaro Yamamichi (IBM Japan)
10:50-11:25 -Invited-
“Scaling of Semiconductor Integrated Circuits and EUV Lithography”
Hidemi Ishiuchi (EIDEC)
11:25-12:00 -Invited-
"EUV Lithography Industrialization and future outlook"
Junji Miyazaki (ASML Japan)
－　Lunch　－【12:00-13:15】
Public talks　　　　13:15-15：20　　　　chairperson: Hiroo Kinoshita (U.of Hyogo), Ryoichi Hajima (QST)
13:15-13:40 "Free-electron laser SACLA and its basics" Yuji Otake (RIKEN)
13:40-14:05 "ERL-Based High-Power EUV-FEL Source" Norio Nakamura (KEK)
14:05-14:30 "Development of damageless EUV multilayer mirrors for high intensity EUV sources" Satoshi Ichimaru (NTT Advanced Technology)
14:30-14:55 "250W LPP-EUV Light Source Development for Semiconductor HVM" Taku Yamazaki (Gigaphoton)
14:55-15:20 "Applications of Accelerators - from Basic Science to Industrial Use" Kiyokazu Sato (Toshiba)
15:20-15:45 -Invited-
"EUV free-electron laser requirements and considerations for semiconductor manufacturing"
Erik Hosler (GLOBALFOUNDRIES)
－　Coffee break　－【15:45-16:15】
Panel Discussion　　16：15-17：25　　　
Panel Discussion " - To realize EUV-FEL light source- "

  • Panelists： Takayuki Uchiyama (Toshiba), Yuji Otake (RIKEN), Norio Nakamura (KEK), Satoshi Ichimaru (NTT AT), Taku Yamazaki (Gigaphoton)
  • Moderator ：Shinji Okazaki (Gigaphoton), Hiroshi Kawata (KEK)
17:25-17:30 Closing address　 Yukihide Kamiya (KEK)
17:30 Closed